In this research, silicon nitride and silicon oxynitride films are prepared by a combined high-power impulse and closed field unbalanced magnetron sputtering (HIPIMS/CFUBMS) deposition technique. The average transmittance of the Si3N4 films on the glass in the visible range is 83.9 % and its hardness is 29.8 Gpa. After introducing 3 sccm O2 gas, the hardness of silicon oxynitride films decreases to 19 Gpa. However its average transmittance on the glass increases to 88.6 % in the visible range. Finally a 5-layer AR coating is deposited on one side glass. Its average transmittance is 93.2 % and its hardness is larger to 19 Gpa.