Thin-film growth rate monitor by normal-incidence reflectance

Fu Rong Huang, Xu Dong Chen, Chun Cheng Wang, Ju Yi Lee

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

An in situ technique for monitoring the growth rate and optical constants of the thin semiconductor layer by the normal-incidence reflectance is proposed. To demonstrate the feasibility of the proposed method, the variation of the air gap between two glasses is used to simulate growth system. We also used the spin coater to thin the thickness of the salad oil to test the performance of the measurement system. The experiments indicate that we can determine the thickness variation and optical constants of the test sample in real time.

原文???core.languages.en_GB???
主出版物標題Recent Development in Machining, Materials and Mechanical Technologies
編輯Jyh-Chen Chen, Usuki Hiroshi, Sheng-Wei Lee, Yiin-Kuen Fuh
發行者Trans Tech Publications Ltd
頁面107-112
頁數6
ISBN(列印)9783038354956
DOIs
出版狀態已出版 - 2015
事件International Conference on Machining, Materials and Mechanical Technologies, IC3MT 2014 - Taipei City, Taiwan
持續時間: 31 8月 20145 9月 2014

出版系列

名字Key Engineering Materials
656-657
ISSN(列印)1013-9826
ISSN(電子)1662-9795

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???event.eventtypes.event.conference???International Conference on Machining, Materials and Mechanical Technologies, IC3MT 2014
國家/地區Taiwan
城市Taipei City
期間31/08/145/09/14

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