Thermal stability and crystallization of Zr-Al-Cu-Ni based amorphous alloy added with boron and silicon

The amorphous Zr_65-x-yAl_7.5 Cu_17.5Ni₁₀Si_xB_y alloy ribbons, x=1-4 and y=1-2, with 0.1 mm thickness were prepared by melt spinning. The thermal properties and microstructure development during the annealing of amorphous alloys were investigated by the combination of differential thermal analysis, differential scanning calorimetry, X-ray diffractometry, and TEM. Both of the glass transition temperature and the crystallization temperature for Zr_65-x-yAl_7.5 Cu_17.5Ni₁₀Si_xB_y alloys increases with the silicon and boron additions and reaches 674 and 754 K, respectively for Zr₆₀Al_7.5 Cu_17.5Ni₁₀Si₄B₁ alloy. The highest T_rg (0.62) and γ value (0.43) occurred at the Zr₆₀Al_7.5Cu_17.5Ni₁₀ Si₄B₁ alloy. In addition, the Zr₆₀Al_7.5Cu_17.5Ni₁₀ Si₄B₁ alloy was revealed to have the highest activation energy of crystallization (about 370 kJ/mol as determined by the Kissinger plot). This value is about 20% higher than the activation energy of crystallization for the Zr₆₅Al_7.5Cu_17.5Ni₁₀ based alloy (314 kJ/mol). In parallel, the alloy 4Si1B also performs a longer incubation time at higher isothermally annealing temperature. All of the evidence implies that Zr₆₀Al_7.5 Cu_17.5Ni₁₀Si₄B₁ alloy exhibits the highest thermal stability among those alloys in this study. The crystallization behavior for the alloy 4Si1B isothermally annealed at the supercooled temperature region for different time has also been examined by TEM and discussed.