The optimization of the high-temperature heat source for a MOCVD vacuum reactor

Hsien Chih Chiu, Chih Kai Hu, Hung I. Chien, Tomi T. Li, Pi Chen Tung

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

Semiconductor equipment usually can be divided into five sub-system modules, (a) heating system, (b) exhausting system, (c) injecting system, (d) power control and (e) vacuum chamber. Metal organic chemical vapor deposition (MOCVD) process is the key process to deposit epitaxy thin film, and the uniformity is determined by the distribution of susceptor temperature. This research focuses on the development of high temperature heat source. The finite element software helps to develop the best results about the optimized geometry of the heater, the thickness of the susceptor, and the distance between the heater and susceptor. Furthermore, the optimum geometry of heater is received by numerical analysis combined with power controller. Compare with the experiment, the confidence level of software is 92%.

原文???core.languages.en_GB???
主出版物標題China Semiconductor Technology International Conference 2015, CSTIC 2015
編輯Cor Claeys, Qinghuang Lin, David Huang, Hanming Wu, Ru Huang, Kafei Lai, Ying Zhang, Beichao Zhang, Kuochun Wu, Larry Chen, Steve Liang, Peilin Song, Hsiang-Lan Lung, Dong Chen, Qi Wang
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781479972418
DOIs
出版狀態已出版 - 8 7月 2015
事件2015 China Semiconductor Technology International Conference, CSTIC 2015 - Shanghai, China
持續時間: 15 3月 201516 3月 2015

出版系列

名字China Semiconductor Technology International Conference 2015, CSTIC 2015

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???event.eventtypes.event.conference???2015 China Semiconductor Technology International Conference, CSTIC 2015
國家/地區China
城市Shanghai
期間15/03/1516/03/15

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