The influence of titanium on the properties of zinc oxide films deposited by radio frequency magnetron sputtering

Material Science

• Titanium 100%
• Magnetron Sputtering 100%
• Oxide Film 100%
• Titanium Oxide 100%
• Zinc Oxide 100%
• ZnO 77%
• Film 66%
• Crystal Structure 11%
• Thin Films 11%
• Carrier Concentration 11%
• Structural Property 11%
• Electrical Resistivity 11%

Keyphrases

• Rutile 100%
• Radio Frequency Magnetron Sputtering 100%
• Zinc Oxide Thin Films 100%
• Doped ZnO 70%
• ZnO Film 60%
• Substrate Temperature 20%
• Working Pressure 20%
• Crystalline Structure 10%
• Glass Substrate 10%
• Carrier Concentration 10%
• Structural Properties 10%
• Visible Spectrum 10%
• Low Resistivity 10%
• Transmittance 10%
• Deposition Parameters 10%
• Pressure-temperature 10%
• Preferred Orientation 10%
• Ti Addition 10%
• Doped Zinc Oxide 10%
• Argon Atmosphere 10%
• Optical Energy Gap 10%