The Demonstration of Gate Dielectric-fuse 4kb OTP Memory Feasible for Embedded Applications in High-k Metal-gate CMOS Generations and beyond

E. R. Hsieh, C. W. Chang, C. C. Chuang, H. W. Chen, Steve S. Chung

研究成果: 書貢獻/報告類型會議論文篇章同行評審

4 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds