The characteristics of EPI-SI thin film in electron cyclotron resonance plasma examined by an integrated plasma diagnostic sub-system

Keyphrases

• Crystallization 100%
• Electron Cyclotron Resonance Plasma 100%
• Plasma Diagnostics 100%
• Diagnostic Subsystem 100%
• Crystallinity 50%
• Film Properties 50%
• Electron Cyclotron Resonance Chemical Vapor Deposition 50%
• Hydrogen Atom 50%
• Growth Mechanism 50%
• Silicon Thin Film 50%
• Silane 50%
• Quality Characteristics 50%
• Film Quality 50%
• Ellipsometer 50%
• Plasma Characteristics 50%
• Quadrupole Mass Spectrometry 50%
• Hydrogen Dilution Ratio 50%
• Optical Emission Spectrometer 50%
• Free Radicals 50%
• Epitaxial Silicon 50%
• Plasma Species 50%
• Si Thin Film 50%
• Adding Hydrogen 50%
• Raman Spectrometer 50%
• Film Plasma 50%

Material Science

• Thin Films 100%
• Film 66%
• Silicon 33%
• Chemical Vapor Deposition 33%
• Dilution 33%
• Quadrupole Mass Spectrometry 33%

Chemical Engineering

• Plasma Diagnostics 100%
• Film 100%
• Mass Spectrometry 20%
• Vapor Deposition 20%
• Chemical Vapor Deposition 20%