The characteristics of EPI-SI thin film in electron cyclotron resonance plasma examined by an integrated plasma diagnostic sub-system

S. K. Jou, L. C. Hu, C. R. Yang, Y. W. Lin, C. J. Wang, T. C. Wei, C. C. Lee, J. Y. Chang, I. C. Chen, Tomi T. Li

研究成果: 書貢獻/報告類型會議論文篇章同行評審

1 引文 斯高帕斯(Scopus)

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Chemical Engineering

Material Science