@inproceedings{a66f5070e63b48d28d688646b58c7203,
title = "The characteristics of EPI-SI thin film in electron cyclotron resonance plasma examined by an integrated plasma diagnostic sub-system",
abstract = "In this study, OES (Optical emission spectrometer) was used to diagnose the variations of plasma species. QMS (Quadrupole mass spectrometry) was utilized to examine the concentration of free radicals in plasma. The epitaxial silicon thin film was deposited by electron cyclotron resonance chemical vapor deposition (ECR-CVD). The film properties related to thickness and crystallinity were investigated by Ellipsometer and Raman Spectrometer. The relationship between the film quality and plasma characteristics with respect to hydrogen dilution ratio of H2/SiH4 was also discussed. Three growth mechanisms were proposed to explain the effect on the crystallization of epi-si thin films based on adding hydrogen atoms to help the crystallization.",
author = "Jou, {S. K.} and Hu, {L. C.} and Yang, {C. R.} and Lin, {Y. W.} and Wang, {C. J.} and Wei, {T. C.} and Lee, {C. C.} and Chang, {J. Y.} and Chen, {I. C.} and Li, {Tomi T.}",
note = "Publisher Copyright: {\textcopyright} 2016 IEEE.; China Semiconductor Technology International Conference, CSTIC 2016 ; Conference date: 13-03-2016 Through 14-03-2016",
year = "2016",
month = may,
day = "2",
doi = "10.1109/CSTIC.2016.7464020",
language = "???core.languages.en_GB???",
series = "China Semiconductor Technology International Conference 2016, CSTIC 2016",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Hanming Wu and Hsiang-Lan Lung and Ying Shi and Dong Chen and David Huang and Qi Wang and Kuochun Wu and Ying Zhang and Cor Claeys and Steve Liang and Ru Huang and Beichao Zhang and Peilin Song and Jiang Yan and Qinghuang Lin and Kafai Lai",
booktitle = "China Semiconductor Technology International Conference 2016, CSTIC 2016",
}