摘要
GaN Schottky diode rectifiers with reverse breakdown (VRB)>2 kV were fabricated on epitaxial layers grown on sapphire substrates. The temperature dependence of VRB and forward turn-on voltage (VF) were measured. The VRB values display a negative temperature coefficient (-0.92 V·K-1 for 25-50 °C; -0.17 V·K-1 for 50-150 °C), indicative of surface- or defect-assisted breakdown. The VF values decrease with increasing temperature. The room temperature breakdown voltage is approximately a factor of three lower than the theoretical maximum expected based on avalanche breakdown, and the current performance of GaN rectifiers is comparable to that of Si at the same on-resistance.
原文 | ???core.languages.en_GB??? |
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頁(從 - 到) | II/- |
期刊 | Materials Science Forum |
卷 | 338 |
出版狀態 | 已出版 - 2000 |
事件 | ICSCRM '99: The International Conference on Silicon Carbide and Related Materials - Research Triangle Park, NC, USA 持續時間: 10 10月 1999 → 15 10月 1999 |