System for measuring optical admittance of a thin film stack

Sheng Hui Chen, Kai Wu, Chien Cheng Kuo, Sheng Ju Ma, Cheng Chung Lee

研究成果: 雜誌貢獻回顧評介論文同行評審

2 引文 斯高帕斯(Scopus)

摘要

A new method based on the polarization interferometer structure has been applied to measure the optical admittance, the refractive index and thickness of a thin film. The structure is a vibration insensitive optical system. There is one Twyman-Green interferometer part to induce a phase difference and one Fizeau interferometer part to induce the interference in the system. The intensities coming from four different polarizers were measured at the same time to prevent mechanical vibration influence. Using the polarization interferometer, the optical admittance, the refractive index and thickness of a single layer of Ta2O5 thin film has been measured. The measurement results were compared with the results obtained by ellipsometer. The results meet reasonable values in both refractive index and thickness.

原文???core.languages.en_GB???
頁(從 - 到)479-482
頁數4
期刊Optical Review
16
發行號4
DOIs
出版狀態已出版 - 2009

指紋

深入研究「System for measuring optical admittance of a thin film stack」主題。共同形成了獨特的指紋。

引用此