摘要
In this study, the hardening behavior of Ni-B thin films with ultra-low boron contents is investigated by synchrotron X-ray diffraction and high resolution transmission electron microscope (HR-TEM). The hardness of Ni-B thin films increases with an increase of boron content within films, the highest hardness is approximately at 1120 Hv. average grain size about 4.64 nm. The analysis of synchrotron X-ray diffraction and HR-TEM indicated the strengthening mechanism of Ni-B thin films can be attributed to a combined effect of solid solution strengthening and fine grain strengthening mechanisms.
原文 | ???core.languages.en_GB??? |
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頁(從 - 到) | 275-277 |
頁數 | 3 |
期刊 | Materials Letters |
卷 | 238 |
DOIs | |
出版狀態 | 已出版 - 1 3月 2019 |