Structural and electrical characteristics of low-dielectric constant porous hydrogen silsesquioxane for Cu metallization

J. H. Wang, W. J. Chen, T. C. Chang, P. T. Liu, S. L. Cheng, J. Y. Lin, L. J. Chen

研究成果: 雜誌貢獻期刊論文同行評審

15 引文 斯高帕斯(Scopus)

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Material Science