Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization

Bo Yi Lin, Wei Bo Liao, Cheng Chung Jaing, Ya Chen Chang, Ching Long Cheng, Cheng Chung Lee, Chien Cheng Kuo

研究成果: 書貢獻/報告類型 › 會議論文篇章 › 同行評審

指紋

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Keyphrases

Material Science