Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization

Bo Yi Lin; Wei Bo Liao; Cheng Chung Jaing; Ya Chen Chang; Ching Long Cheng; Cheng Chung Lee; Chien Cheng Kuo

doi:10.1364/oic.2016.wb.7

Stress analysis of SiO_x: C films deposited by HMDSO/O₂ plasma polymerization

Bo Yi Lin
, Wei Bo Liao
, Cheng Chung Jaing
, Ya Chen Chang
, Ching Long Cheng
, Cheng Chung Lee
, Chien Cheng Kuo

光電科學與工程學系

研究成果: 書貢獻/報告類型 › 會議論文篇章 › 同行評審

摘要

SiO_x:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.

原文	???core.languages.en_GB???
主出版物標題	Optical Interference Coatings, OIC 2016
發行者	Optica Publishing Group (formerly OSA)
ISBN（列印）	9781943580132
DOIs	https://doi.org/10.1364/oic.2016.wb.7
出版狀態	已出版 - 2016
事件	Optical Interference Coatings, OIC 2016 - Tucson, United States 持續時間: 19 6月 2016 → 24 6月 2016

出版系列

名字	Optics InfoBase Conference Papers
ISSN（電子）	2162-2701

???event.eventtypes.event.conference???

???event.eventtypes.event.conference???	Optical Interference Coatings, OIC 2016
國家/地區	United States
城市	Tucson
期間	19/06/16 → 24/06/16

存取文件

10.1364/oic.2016.wb.7

引用此

@inproceedings{b77dffbbe20f4da59b488f5114ab46d1,

title = "Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization",

abstract = "SiOx:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90\% and the stress of the multilayers was reduced 63.5 \%.",

author = "Lin, \{Bo Yi\} and Liao, \{Wei Bo\} and Jaing, \{Cheng Chung\} and Chang, \{Ya Chen\} and Cheng, \{Ching Long\} and Lee, \{Cheng Chung\} and Kuo, \{Chien Cheng\}",

note = "Publisher Copyright: {\textcopyright} OSA 2016.; Optical Interference Coatings, OIC 2016 ; Conference date: 19-06-2016 Through 24-06-2016",

year = "2016",

doi = "10.1364/oic.2016.wb.7",

language = "???core.languages.en\_GB???",

isbn = "9781943580132",

series = "Optics InfoBase Conference Papers",

publisher = "Optica Publishing Group (formerly OSA)",

booktitle = "Optical Interference Coatings, OIC 2016",

}

Lin, BY, Liao, WB, Jaing, CC, Chang, YC, Cheng, CL, Lee, CC & Kuo, CC 2016, Stress analysis of SiO_x: C films deposited by HMDSO/O₂ plasma polymerization. 於 Optical Interference Coatings, OIC 2016. Optics InfoBase Conference Papers, Optica Publishing Group (formerly OSA), Optical Interference Coatings, OIC 2016, Tucson, United States, 19/06/16. https://doi.org/10.1364/oic.2016.wb.7

TY - GEN

T1 - Stress analysis of SiOx

T2 - Optical Interference Coatings, OIC 2016

AU - Lin, Bo Yi

AU - Liao, Wei Bo

AU - Jaing, Cheng Chung

AU - Chang, Ya Chen

AU - Cheng, Ching Long

AU - Lee, Cheng Chung

AU - Kuo, Chien Cheng

PY - 2016

Y1 - 2016

N2 - SiOx:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.

AB - SiOx:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.

UR - https://www.scopus.com/pages/publications/85086057033

U2 - 10.1364/oic.2016.wb.7

DO - 10.1364/oic.2016.wb.7

M3 - 會議論文篇章

AN - SCOPUS:85086057033

SN - 9781943580132

T3 - Optics InfoBase Conference Papers

BT - Optical Interference Coatings, OIC 2016

PB - Optica Publishing Group (formerly OSA)

Y2 - 19 June 2016 through 24 June 2016

ER -

Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization

摘要

出版系列

???event.eventtypes.event.conference???

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指紋

引用此

Stress analysis of SiO_x: C films deposited by HMDSO/O₂ plasma polymerization