Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization

Bo Yi Lin, Wei Bo Liao, Cheng Chung Jaing, Ya Chen Chang, Ching Long Cheng, Cheng Chung Lee, Chien Cheng Kuo

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

SiOx:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.

原文???core.languages.en_GB???
主出版物標題Optical Interference Coatings, OIC 2016
發行者OSA - The Optical Society
ISBN(列印)9781943580132
DOIs
出版狀態已出版 - 2016
事件Optical Interference Coatings, OIC 2016 - Tucson, United States
持續時間: 19 6月 201624 6月 2016

出版系列

名字Optics InfoBase Conference Papers

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???event.eventtypes.event.conference???Optical Interference Coatings, OIC 2016
國家/地區United States
城市Tucson
期間19/06/1624/06/16

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