Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

Yi Ruei Lin, K. Y. Lai, Hsin Ping Wang, Jr Hau He

研究成果: 雜誌貢獻期刊論文同行評審

70 引文 斯高帕斯(Scopus)

摘要

Slope-tunable Si nanorod arrays (NRAs) were fabricated with colloidal lithography and reactive ion etching (RIE). Sharpened NRAs fabricated by increasing the SF6/O2 flow ratio during RIE exhibit enhanced antireflection (AR) and hydrophobic properties, which are attributed to the smooth gradient in the effective refractive index of NRAs, and the enlarged water/air interface of the water drops in the NRA layers, respectively. Enhanced AR characteristics via modifying the slope of NRAs are accompanied by broad-band working ranges, omnidirectionality, and polarization insensitivity. Detailed experimental and theoretical analysis of slope-tunable NRAs should benefit the development of various self-cleaning optoelectronic devices with efficient light management.

原文???core.languages.en_GB???
頁(從 - 到)2765-2768
頁數4
期刊Nanoscale
2
發行號12
DOIs
出版狀態已出版 - 11月 2010

指紋

深入研究「Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties」主題。共同形成了獨特的指紋。

引用此