摘要
The heteroepitaxial growth of single-crystal rare earth oxide films on single-crystal gallium nitride (GaN) films was investigated. The epitaxial overgrowth of single crystal GaN films on the rare earth oxide films was also examined. A sixfold symmetry in the in-plane epitaxy was observed using reflection high-energy electron diffraction. The single-crystal oxide films were found to be the high temperature hexagonal phases of the sesquioxides. The crystallographic hexagonal close-packed (hcp) structures of both layers of GaN were also investigated.
原文 | ???core.languages.en_GB??? |
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頁(從 - 到) | 1274-1277 |
頁數 | 4 |
期刊 | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
卷 | 20 |
發行號 | 3 |
DOIs | |
出版狀態 | 已出版 - 5月 2002 |
事件 | 20th North American Conference on Molecular Beam Epitaxy - Providence, RI, United States 持續時間: 1 10月 2001 → 3 10月 2001 |