Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property

Chun Tse Wu, Yao-Li Liu, Po Yen Lai, Shih Hung Chen

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.

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主出版物標題CLEO
主出版物子標題Applications and Technology, CLEO:A and T 2023
發行者Optical Society of America
ISBN(電子)9781957171258
DOIs
出版狀態已出版 - 2023
事件CLEO: Applications and Technology, CLEO:A and T 2023 - Part of Conference on Lasers and Electro-Optics 2023 - San Jose, United States
持續時間: 7 5月 202312 5月 2023

出版系列

名字CLEO: Applications and Technology, CLEO:A and T 2023

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???event.eventtypes.event.conference???CLEO: Applications and Technology, CLEO:A and T 2023 - Part of Conference on Lasers and Electro-Optics 2023
國家/地區United States
城市San Jose
期間7/05/2312/05/23

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