Simulation and correction of angular defects in two-photon lithography

Chin Te Lin, Hsu Fan, Michel Bouriau, Chao Yaug Liao, Chih Lang Lin, Cédrîc Masclet, Jean Claude Léon, Tien Tung Chung, Patrice L. Baldeck

研究成果: 雜誌貢獻期刊論文同行評審

2 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds