Silicon based guided-mode Resonance nano-photonic device

C. M. Wang; C. L. Xu; J. Y. Chang; C. C. Lee

doi:10.1117/12.559209

Silicon based guided-mode Resonance nano-photonic device

C. M. Wang, C. L. Xu, J. Y. Chang, C. C. Lee

研究成果: 雜誌貢獻 › 會議論文 › 同行評審

摘要

An out-of-plane guided-mode resonance (GMR) filter on a single Si chip using a two-layer polysilicon surface micromachining process was proposed. To the best of our knowledge, this is the first time that a monolithic optical filter has been integrated on a silicon microoptical bench. This device can be used as a bi-directional transceiver filter. The extinction ratio between 1550nm and 1310nm could be as low as 40dB and the channel passband at 1550nm was 20nm.

原文	???core.languages.en_GB???
文章編號	45
頁（從 - 到）	275-278
頁數	4
期刊	Proceedings of SPIE - The International Society for Optical Engineering
卷	5515
DOIs	https://doi.org/10.1117/12.559209
出版狀態	已出版 - 2004
事件	Nanoengineering: Fabrication, Properties, Optics, and Devices - Denver, CO, United States 持續時間: 4 8月 2004 → 6 8月 2004

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10.1117/12.559209

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AU - Xu, C. L.

AU - Chang, J. Y.

AU - Lee, C. C.

PY - 2004

Y1 - 2004

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AB - An out-of-plane guided-mode resonance (GMR) filter on a single Si chip using a two-layer polysilicon surface micromachining process was proposed. To the best of our knowledge, this is the first time that a monolithic optical filter has been integrated on a silicon microoptical bench. This device can be used as a bi-directional transceiver filter. The extinction ratio between 1550nm and 1310nm could be as low as 40dB and the channel passband at 1550nm was 20nm.

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KW - Guided-mode resonance

KW - Surface micromachining

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Silicon based guided-mode Resonance nano-photonic device

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