SiGe quantum rings by ultra-high vacuum chemical vapor deposition

C. H. Lee, C. M. Lin, C. W. Liu, H. T. Chang, S. W. Lee, P. Shushpannikov, V. A. Gorodtsov, R. V. Goldstein

研究成果: 書貢獻/報告類型會議論文篇章同行評審

2 引文 斯高帕斯(Scopus)

摘要

SiGe quanrum rings (QRs) grown at 500°C and 600°C were observed on SiGe quantum dots (QDs) capped with Si. Average depth and diameter are 9 nm and 185 nm, respectively, for QRs at 500°C, while those are 0.9 nm and 84 nm for QRs at 600°C. Ge out-diffusion mechanism is proposed to be responsible for nanorings formation at 500°C, and Si surface diffusion toward strain-free edges is proposed to be responsible for nanorings formation at 600°C. Raman spectroscopy suggests that formation of QRs at 600°C is closely correlated with a strain-driven process. QRs grown at 600°C are the metastable states and can be only observed in very limited conditions. Both thick cap and high thermal budget can destroy SiGe nanorings structures.

原文???core.languages.en_GB???
主出版物標題ECS Transactions - SiGe, Ge, and Related Compounds 3
主出版物子標題Materials, Processing, and Devices
發行者Electrochemical Society Inc.
頁面647-657
頁數11
版本10
ISBN(列印)9781566776561
DOIs
出版狀態已出版 - 2009
事件3rd SiGe, Ge, and Related Compounds: Materials, Processing and Devices Symposium - 214th ECS Meeting - Honolulu, HI, United States
持續時間: 12 10月 200817 10月 2008

出版系列

名字ECS Transactions
號碼10
16
ISSN(列印)1938-5862
ISSN(電子)1938-6737

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???event.eventtypes.event.conference???3rd SiGe, Ge, and Related Compounds: Materials, Processing and Devices Symposium - 214th ECS Meeting
國家/地區United States
城市Honolulu, HI
期間12/10/0817/10/08

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