Si-based UV transparent subwavelength optical elements

Chien Chieh Lee, Che Lung Hsu, Chih Ming Wang, Jing Yi Chen, Jenq Yang Chang, Gou Chung Chi

研究成果: 雜誌貢獻會議論文同行評審


The hydrogenated Silicon nitride film is well developed to form a passivation layer for non-volatile memory devices. It has many superior chemical, electrical, and mechanical properties. In addition, it also has excellent optical properties. It is transparent in UV and DUV range, with a high refractive index of about 1.7-2. Owing to its superior mechanical and optical properties, we used a hydrogenated silicon nitride (SiNxH Y) membrane as an optical phase element. By using e-beam lithography, we demonstrate on feasibility for the fabrication of subwavelength optical elements, such as waveplate, polarizer, and polarized beam splitter on a silicon-based low stress SiNxHy membrane for the UV region applications. An SiNxHY film was deposited by plasma enhanced chemical vapor deposition (PECVD) and the freestanding membrane is formed by KOH silicon backside etching, from which substrate materials are removed. The membrane's morphology and geometries of subwavelength optical elements were verified by means of an scanning electron microscope (SEM), and the optical performance characteristics of these subwavelength optical elements are shown. The experimental datas agree well with theoretical predictions.

頁(從 - 到)1-8
期刊Proceedings of SPIE - The International Society for Optical Engineering
出版狀態已出版 - 2005
事件Nanoengineering: Fabrication, Properties, Optics, and Devices II - San Diego, CA, United States
持續時間: 3 8月 20054 8月 2005


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