In this study, a hollow optical waveguide with omni-directional reflectors in silicon-based materials was design, fabricated and characterized. By using dry etching technique, plasma-enhanced chemical vapor deposition for Si/SiO 2 thin films and covering another wafer with omni-directional reflector together, the waveguides can be formed with an air core of 1.2μm × 1.3μm. A uniform propagation loss of the waveguide to be around 1.7dB/cm for C+L band was found for the TE and TM modes. Polarization- independent hollow optical waveguides were obtained with the hollow waveguide structure.
|頁（從 - 到）||6589-6593|
|出版狀態||已出版 - 12月 2004|