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Residual stress analysis for oxide thin film deposition on flexible substrate using finite element method
Hsi Chao Chen, Chen Yu Huang, Ssu Fan Lin,
Sheng Hui Chen
光電科學與工程學系
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引文 斯高帕斯(Scopus)
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排序方式
重量
按字母排序
Mathematics
Flexible Substrate
100%
Residual Stress
66%
Residual Analysis
66%
Oxides
62%
Stress Analysis
60%
Thin Films
56%
Finite Element Method
37%
Substrate
26%
Sputtering
20%
SiO2
18%
Surface Growth
17%
Adhesion
14%
Oxygen
14%
Defects
11%
Predict
10%
Internal
9%
Evaluate
9%
Model
7%
Simulation
7%
Engineering & Materials Science
Oxide films
56%
Stress analysis
46%
Thin films
42%
Residual stresses
39%
Substrates
31%
Finite element method
28%
Epitaxial films
13%
Sputtering
11%
Crystalline materials
9%
Compressive stress
9%
Adhesion
8%
Oxygen
7%
Temperature
7%
Defects
6%
Physics & Astronomy
stress analysis
54%
residual stress
41%
finite element method
37%
oxides
28%
thin films
23%
oxide films
8%
adhesion
7%
sputtering
7%
direct current
7%
oxygen
5%
temperature
5%
defects
5%
simulation
3%
Chemical Compounds
Residual Stress
60%
Oxide
24%
Liquid Film
16%
Epitaxial Film
16%
Strain
15%
Sputtering
12%
Error
8%
Simulation
7%
Volume
6%
Dioxygen
5%
Surface
3%