Processing and characterization of LiNbO₃ thin film for metal ferroelectric semiconductor field effect transistor (MFSFET) application

Keyphrases

• Hysteresis Curve 100%
• Oriented Films 100%
• LiNbO3 Thin Film 100%
• Metal-ferroelectric-semiconductor Field Effect Transistor 100%
• C-axis 50%
• Capacitors 50%
• Clockwise Rotation 50%
• Metal-organic Decomposition 50%
• RF Magnetron Sputtering 50%
• Si(111) Substrate 50%
• C-V Measurement 50%
• Ferroelectric Switching 50%
• Remnant Polarization 50%
• Sawyer-Tower 50%
• Ferroelectric Semiconductors 50%
• Voltage Hysteresis 50%

Engineering

• Thin Films 100%
• Field-Effect Transistor 100%
• Hysteresis Curve 100%
• Metal-Ferroelectric-Semiconductor 100%
• Magnetron 50%
• Polysilicon 50%
• Tower 50%

Material Science

• Thin Films 100%
• Field Effect Transistor 100%
• Ferroelectric Material 100%
• Film 66%
• Electronic Circuit 33%
• Magnetron Sputtering 33%
• Capacitor 33%