Process study of chemically vapour-deposited SnOx (x≈2) films

J. C. Lou, M. S. Lin, J. I. Chyi, J. H. Shieh

研究成果: 雜誌貢獻期刊論文同行評審

27 引文 斯高帕斯(Scopus)

摘要

The physical characteristics of SnOx(x≈2) films deposited onto Pyrex glass substrates by chemical vapour deposition are studied. The temperature dependence indicates that films deposited at 600 °C have good polycrystallinity. The electrical conductivity of the 600 °C films is mainly controlled by the variation in the SnCl4 vapour flow rate. A subsequent thermal annealing process can even reduce the sheet resistance to 400ω/□. In addition, the visible absorption shows that the 600 °C films tend to lose their transparency in the short wavelength range of the visible spectrum.

原文???core.languages.en_GB???
頁(從 - 到)163-173
頁數11
期刊Thin Solid Films
106
發行號3
DOIs
出版狀態已出版 - 19 8月 1983

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