Preferential etching of Si(111) and Si(001) in dilute NH4F solutions: as probed by in situ STM
Kingo Itaya, Shueh Lin Yau, Kazutoshi Kaji
研究成果: 雜誌貢獻 › 會議論文 › 同行評審
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引文
斯高帕斯(Scopus)