@inproceedings{75b1c8d43b6b4dc4892866d250a8fb75,
title = "Plasma diagnostics of resonance magnetic field effects on a-Si:H thin films deposition using electron cyclotron resonance plasma",
abstract = "This study demonstrated the use of quadrupole mass spectrometer (QMS) and optical emission spectrometer (OES) in diagnosing plasma process of electron cyclotron resonance chemical vapor deposition (ECR-CVD) process. The result showed that, by adjusting main magnetic coil current in ECR-CVD system, the relationship between plasma chemical composition and magnetic field was discussed in this paper. As the results, by controlling appropriate magnetic field configuration, the characteristics of a-Si:H thin film such as photosensitive, microstructure and deposition rate could be improved.",
author = "Hu, {L. C.} and Lin, {Y. W.} and Wang, {C. J.} and Wei, {T. C.} and Yang, {C. R.} and Lee, {C. C.} and Chang, {J. Y.} and Chen, {I. C.} and Li, {Tomi T.}",
note = "Publisher Copyright: {\textcopyright} 2015 IEEE.; 2015 China Semiconductor Technology International Conference, CSTIC 2015 ; Conference date: 15-03-2015 Through 16-03-2015",
year = "2015",
month = jul,
day = "8",
doi = "10.1109/CSTIC.2015.7153464",
language = "???core.languages.en_GB???",
series = "China Semiconductor Technology International Conference 2015, CSTIC 2015",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Cor Claeys and Qinghuang Lin and David Huang and Hanming Wu and Ru Huang and Kafei Lai and Ying Zhang and Beichao Zhang and Kuochun Wu and Larry Chen and Steve Liang and Peilin Song and Hsiang-Lan Lung and Dong Chen and Qi Wang",
booktitle = "China Semiconductor Technology International Conference 2015, CSTIC 2015",
}