TY - JOUR
T1 - Photoluminescent or blackened silicon surfaces synthesized with copper-assisted chemical etching
T2 - For energy applications
AU - Kuo, Ken Hua
AU - Ku, Wei Hao
AU - Lee, Benjamin T.H.
N1 - Publisher Copyright:
© 2020 The Author(s).
PY - 2020/1/17
Y1 - 2020/1/17
N2 - The metal-assisted chemical etching (MACE) of silicon-based substrates can fabricate nanostructures for various energy applications. The drawback of using copper as a replacement for noble metals in MACE (i.e. Cu-ACE) is the self-dissolution of Cu during processing. However, the implementation of two-step processing, including electroless metal deposition and oxidant (H2O2)–assisted hydrofluoric etching, solves the issue. Here, we determined that when p++-type silicon was applied in the Cu-ACE process, a photoluminescent silicon layer appeared on the etched surface. This result was surprising because photoluminescent silicon is fairly difficult to achieve with regular MACE processing and p++-type silicon is also unsuitable for MACE processing, even when used as an ‘etch-stop’ substrate. On the other hand, when using ultraviolet (UV) irradiation with Cu-ACE, a blackened silicon surface, rather than photoluminescent silicon, developed. Here, we demonstrate a technique for either producing a photoluminescent silicon surface or blackening the silicon surface by single Cu-ACE processing. Cu-ACE processing can be developed into a cost-efficient production technology for silicon-based energy applications, such as silicon photonics and silicon solar cells.
AB - The metal-assisted chemical etching (MACE) of silicon-based substrates can fabricate nanostructures for various energy applications. The drawback of using copper as a replacement for noble metals in MACE (i.e. Cu-ACE) is the self-dissolution of Cu during processing. However, the implementation of two-step processing, including electroless metal deposition and oxidant (H2O2)–assisted hydrofluoric etching, solves the issue. Here, we determined that when p++-type silicon was applied in the Cu-ACE process, a photoluminescent silicon layer appeared on the etched surface. This result was surprising because photoluminescent silicon is fairly difficult to achieve with regular MACE processing and p++-type silicon is also unsuitable for MACE processing, even when used as an ‘etch-stop’ substrate. On the other hand, when using ultraviolet (UV) irradiation with Cu-ACE, a blackened silicon surface, rather than photoluminescent silicon, developed. Here, we demonstrate a technique for either producing a photoluminescent silicon surface or blackening the silicon surface by single Cu-ACE processing. Cu-ACE processing can be developed into a cost-efficient production technology for silicon-based energy applications, such as silicon photonics and silicon solar cells.
UR - http://www.scopus.com/inward/record.url?scp=85079741038&partnerID=8YFLogxK
U2 - 10.1149/2162-8777/ab682f
DO - 10.1149/2162-8777/ab682f
M3 - 期刊論文
AN - SCOPUS:85079741038
SN - 2162-8769
VL - 9
JO - ECS Journal of Solid State Science and Technology
JF - ECS Journal of Solid State Science and Technology
IS - 2
M1 - 024006
ER -