Oxygen diffusion barrier on interfacial layer formed with remote NH3 plasma treatment

Dun Bao Ruan, Kuei Shu Chang-Liao, Hsin I. Yeh, Fu Yang Chu, Kai Chun Yang, Po Chun Wu, E. Ray Hsieh

研究成果: 雜誌貢獻期刊論文同行評審

1 引文 斯高帕斯(Scopus)

摘要

An oxidation or nitridation treatment was performed on the interfacial layer (IL) with optimal oxidation state in order to form an oxygen diffusion barrier for Ge nMOSFET. Through the analysis of X-ray photoelectron spectroscopy and electrical characterization of Ge nMOSFET, the reaction mechanism and physical model were studied in details. The fewer interface traps and lower subthreshold swing can be achieved by forming oxygen diffusion barrier in an optimal IL with remote NH3 plasma. As compared to devices with oxidation treatments, that improvement can be attributed to the nitrogen passivation and alloy-like interface formation. The proposed oxygen diffusion barrier with remote NH3 plasma treatment on IL is a promising technique to improve the interface properties effectively without influencing equivalent oxide thickness for high performance Ge nMOSFET.

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文章編號127588
期刊Surface and Coatings Technology
423
DOIs
出版狀態已出版 - 15 10月 2021

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