摘要
Ni dopants typically exist as Ni 2+ oxidation state in metal oxides. We report that as Ni is co-doped with P in Ni(P):SnO 2 , P promotes Ni 2+ into Ni 3+ , which acts as acceptor and coverts n-type SnO 2 to p-type conduction. Significant hole concentration (4.5 × 10 18 cm -3 ) of p-type Ni(P):SnO 2 can be obtained. The chemical state of Ni 3+ in Ni(P):SnO 2 is verified by ultra-violet and x-ray photoelectron spectroscopy. With the developed p-Ni(P):SnO 2 , transparent p-Ni(P):SnO 2 /i-SnO 2 /n-ITO p-i-n structure was fabricated and characterized: low leakage-current (8.41 × 10 -5 A at -5 V), turn-on voltage (4.68 eV), good transmittance (85%), and small ideality-factor (1.73).
原文 | ???core.languages.en_GB??? |
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頁(從 - 到) | 33-37 |
頁數 | 5 |
期刊 | Applied Surface Science |
卷 | 337 |
DOIs | |
出版狀態 | 已出版 - 15 5月 2015 |