Numerical study of laser-produced plasma extreme ultraviolet light emission using dual-pulse scheme

Po Yen Lai, Kao Sheng Jao, Rong Tz Wei, Chia Ying Hsieh, Shih Hung Chen

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

We numerically demonstrated effects of pre-pulse properties on extreme ultraviolet emission from laser-produced Sn plasmas using a dual-pulse scheme, which increases the EUV conversion efficiency from 3.6% with the single-pulse scheme to 5.9%.

原文???core.languages.en_GB???
主出版物標題Compact EUV and X-ray Light Sources, EUVXRAY 2018
發行者OSA - The Optical Society
ISBN(電子)9781557528209
DOIs
出版狀態已出版 - 2018
事件Compact EUV and X-ray Light Sources, EUVXRAY 2018 - Strasbourg, France
持續時間: 26 3月 201728 3月 2017

出版系列

名字Optics InfoBase Conference Papers
Part F85-EUVXRAY 2018

???event.eventtypes.event.conference???

???event.eventtypes.event.conference???Compact EUV and X-ray Light Sources, EUVXRAY 2018
國家/地區France
城市Strasbourg
期間26/03/1728/03/17

指紋

深入研究「Numerical study of laser-produced plasma extreme ultraviolet light emission using dual-pulse scheme」主題。共同形成了獨特的指紋。

引用此