跳至主導覽
跳至搜尋
跳過主要內容
國立中央大學 首頁
說明與常見問題
English
中文
首頁
人才檔案
研究單位
研究成果
資料集
榮譽/獲獎
學術活動
新聞/媒體
影響
按專業知識、姓名或所屬機構搜尋
Novel solid-state pressureless approach for Cu-embedded intermetallic interconnects at low temperature
Kuo Shuo Huang, Tzu Hao Shen, Wei Liu, Jui Lin Chao,
Albert T. Wu
化學工程與材料工程學系
研究成果
:
雜誌貢獻
›
期刊論文
›
同行評審
1
引文 斯高帕斯(Scopus)
總覽
指紋
指紋
深入研究「Novel solid-state pressureless approach for Cu-embedded intermetallic interconnects at low temperature」主題。共同形成了獨特的指紋。
排序方式
重量
按字母排序
Keyphrases
Intermetallics
100%
Low Temperature
100%
Solid State
100%
Intermetallic Compounds
100%
Pressureless
100%
Mathematical Model
33%
Solid-state Bonding
33%
Interfacial Area
33%
In Situ TEM
33%
Bonding Process
33%
Void Fraction
33%
Interdiffusion
33%
Shear Strength
33%
Cu-based
33%
Core Particle
33%
SAC305
33%
Joint Shear Strength
33%
Coherent Interface
33%
Joint Properties
33%
Cu-phase
33%
Intermetallic Compound Thickness
33%
Cu-core
33%
Compound Shell
33%
Intermetallic Joints
33%
Engineering
Joints (Structural Components)
100%
Low-Temperature
100%
Interconnects
100%
Intermetallics
100%
Shear Strength
33%
Bonding Process
16%
Mixed Phase
16%
Interfacial Area
16%
Interdiffusion
16%
Coherent Interface
16%
Porosity
16%
Mathematical Model
16%
Earth and Planetary Sciences
Shear Strength
100%
Porosity
50%
Immunology and Microbiology
Shear Strength
100%
Porosity
50%
Material Science
Intermetallics
100%
Shear Strength
33%
Void Fraction
16%