NO/NOx removal with C2H2 as additive via dielectric barrier discharges

Moo Been Chang, Shyh Chaur Yang

研究成果: 雜誌貢獻期刊論文同行評審

27 引文 斯高帕斯(Scopus)

指紋

深入研究「NO/NOx removal with C2H2 as additive via dielectric barrier discharges」主題。共同形成了獨特的指紋。

Keyphrases

Engineering

Chemical Engineering