Nanoscale Electron Bunching in Laser-Triggered Ionization Injection in Plasma Accelerators

X. L. Xu, C. H. Pai, C. J. Zhang, F. Li, Y. Wan, Y. P. Wu, J. F. Hua, W. Lu, W. An, P. Yu, C. Joshi, W. B. Mori

研究成果: 雜誌貢獻期刊論文同行評審

19 引文 斯高帕斯(Scopus)

摘要

Ionization injection is attractive as a controllable injection scheme for generating high quality electron beams using plasma-based wakefield acceleration. Because of the phase-dependent tunneling ionization rate and the trapping dynamics within a nonlinear wake, the discrete injection of electrons within the wake is nonlinearly mapped to a discrete final phase space structure of the beam at the location where the electrons are trapped. This phenomenon is theoretically analyzed and examined by three-dimensional particle-in-cell simulations which show that three-dimensional effects limit the wave number of the modulation to between >2k0 and about 5k0, where k0 is the wave number of the injection laser. Such a nanoscale bunched beam can be diagnosed by and used to generate coherent transition radiation and may find use in generating high-power ultraviolet radiation upon passage through a resonant undulator.

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文章編號034801
期刊Physical Review Letters
117
發行號3
DOIs
出版狀態已出版 - 15 7月 2016

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