Nanomechanical properties of AlN(1 0 3) thin films by nanoindentation

Sheng Rui Jian, Guo Ju Chen, Jason S.C. Jang, Yi Shao Lai

研究成果: 雜誌貢獻期刊論文同行評審

24 引文 斯高帕斯(Scopus)

摘要

In this study, the crystalline structure, surface roughness and nanomechanical properties of AlN thin films are investigated by using X-ray diffraction (XRD), atomic force microscopy (AFM) and nanoindentation techniques. The AlN thin films were deposited on Si(1 0 0) substrates with various sputtering powers by means of the radio frequency (RF) magnetron sputtering system. XRD results show that the crystalline structures and orientations of the AlN thin films have the strong (1 0 3) orientations. Both of the average grain size and surface roughness of AlN(1 0 3) thin films exhibit an increasing trend with the sputtering power. In addition, the hardness and Young's modulus of AlN(1 0 3) thin films increased as the sputtering power increased from 150 to 350 W, with the larger results being obtained at 350 W.

原文???core.languages.en_GB???
頁(從 - 到)219-222
頁數4
期刊Journal of Alloys and Compounds
494
發行號1-2
DOIs
出版狀態已出版 - 2 4月 2010

指紋

深入研究「Nanomechanical properties of AlN(1 0 3) thin films by nanoindentation」主題。共同形成了獨特的指紋。

引用此