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Multi-band filter design with less total film thickness for short-wave infrared
Yung Jhe Yan
, I. Pen Chien
, Po Han Chen
,
Sheng Hui Chen
, Yi Chun Tsai
, Mang Ou-Yang
光電科學與工程學系
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Keyphrases
Filter Design
100%
Film Thickness
100%
Short-wave Infrared
100%
Multi-band Filter
100%
Bandpass Filter
50%
Silicone
50%
High Refractive Index Material
50%
Lithography Process
33%
Rutile
33%
Visible Spectrum
33%
Low Index
33%
Lift-off
33%
Multiband Bandpass Filter
33%
High Performance
16%
Filter Method
16%
Absorptance
16%
Stopband
16%
Optical Devices
16%
Deposition Process
16%
High Transmittance
16%
Optical Interference
16%
Ta2O5
16%
Photolithography
16%
Wavelength Range
16%
Central Wavelength
16%
Device Processing
16%
Photoresist
16%
Film Materials
16%
Thin Film Layers
16%
Dielectric Materials
16%
High Transmission
16%
Depositional System
16%
Ion-assisted Deposition
16%
Large Gap
16%
Process Matrix
16%
High Spectrum
16%
Filter Array
16%
Material Cost
16%
High-index Materials
16%
Infrared Applications
16%
Electric Gun
16%
Low Refractive Index Materials
16%
Transmittance Ratio
16%
Black Matrix
16%
Engineering
Filter Design
100%
Bandpass Filter
100%
Band Filter
100%
Refractive Index
60%
Refractivity
60%
Lithography
40%
Film Material
40%
Thin Films
20%
Dielectrics
20%
Experimental Trial
20%
Deposition Process
20%
Pass Band
20%
Optical Lithography
20%
Photoresist
20%
Central Wavelength
20%
Deposition System
20%
Material Cost
20%
Film Layer
20%
Assisted Deposition
20%
Material Index
20%
Conventional Material
20%
Stop Band
20%
Material Science
Film Thickness
100%
Refractive Index
50%
Polysiloxane
50%
Film
33%
Lithography
33%
Titanium Dioxide
33%
Thin Films
16%
Ion Beam Assisted Deposition
16%
Optical Device
16%
Dielectric Material
16%