Molecular-beam epitaxial growth of InxAl1-xAs on GaAs

Jen Inn Chyi, Jia Lin Shieh, Ray Ming Lin, Tzer En Nee, Jen Wei Pan

研究成果: 雜誌貢獻期刊論文同行評審

4 引文 斯高帕斯(Scopus)

摘要

The surface reconstruction of InAlAs on GaAs between 490 and 700°C has been investigated during molecular-beam epitaxial growth. It is found that the surface reconstruction of InAlAs is similar to that of AlGaAs alloy. The (2×1) and (1×1) surfaces occur at a substrate temperature between 490 and 650°C, while at a temperature above 650°C, the ordered As-stabilized (3×2 surface appeared during the steady-state growth. InAlAs/GaAs heteroepitaxial layers have been analyzed and reveal that the residual strain in the epilayers is strongly dependent on the composition as well as the thickness of the epilayer. These characteristics are consistent with the InGaAs/GaAs system.

原文???core.languages.en_GB???
頁(從 - 到)699-701
頁數3
期刊Applied Physics Letters
65
發行號6
DOIs
出版狀態已出版 - 1994

指紋

深入研究「Molecular-beam epitaxial growth of InxAl1-xAs on GaAs」主題。共同形成了獨特的指紋。

引用此