Modeling the reaction of PQ:DMNA/PMMA photopolymer recorded at 640 nm

PO JUNG LIN; YU HUA HSIEH; TE YUAN CHUNG

doi:10.1364/OME.431171

Modeling the reaction of PQ:DMNA/PMMA photopolymer recorded at 640 nm

PO JUNG LIN
, YU HUA HSIEH
, TE YUAN CHUNG

光電科學與工程學系

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

1 引文斯高帕斯（Scopus）

摘要

The reaction model and the corresponding equations of PQ:DMNA/PMMA photopolymer recording at 640 nm are proposed. A series of experiments were conducted to estimate the parameters used in the equations by measuring only the dynamic behavior of the diffraction efficiency of the recorded grating. Recording the PQ:DMNA/PMMA grating can then be well-predicted and match with the experiment.

原文	???core.languages.en_GB???
頁（從 - 到）	2608-2617
頁數	10
期刊	Optical Materials Express
卷	11
發行號	8
DOIs	https://doi.org/10.1364/OME.431171
出版狀態	已出版 - 1 8月 2021

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10.1364/OME.431171

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abstract = "The reaction model and the corresponding equations of PQ:DMNA/PMMA photopolymer recording at 640 nm are proposed. A series of experiments were conducted to estimate the parameters used in the equations by measuring only the dynamic behavior of the diffraction efficiency of the recorded grating. Recording the PQ:DMNA/PMMA grating can then be well-predicted and match with the experiment.",

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AB - The reaction model and the corresponding equations of PQ:DMNA/PMMA photopolymer recording at 640 nm are proposed. A series of experiments were conducted to estimate the parameters used in the equations by measuring only the dynamic behavior of the diffraction efficiency of the recorded grating. Recording the PQ:DMNA/PMMA grating can then be well-predicted and match with the experiment.

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Modeling the reaction of PQ:DMNA/PMMA photopolymer recorded at 640 nm

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