Modeling extreme-ultraviolet emission from laser-produced plasma using particle-in-cell method

Po Yen Lai, Shih Hung Chen

研究成果: 書貢獻/報告類型會議論文篇章同行評審

2 引文 斯高帕斯(Scopus)

摘要

A one-dimensional (1D) collisional relativistic particle-in-cell (PIC) code with ionization processes has been developed to investigate the key semiconductor manufacturing device, i.e., the extreme ultraviolet (EUV) light source from laserproduced plasmas (LPP). Unlike hydrodynamic approach, the kinetic model describes laser heating, energy transport and ultrafast electron dynamics with least approximations. The two major numerical effects of PIC simulations, i.e., numerical self-heating and numerical thermalization, are also studied and mitigated in the collisional PIC model. The integrated numerical model is achieved by simulating the dense plasma using collisional PIC model and estimating EUV emission and mean opacities according to the respective weighted oscillator strengths of tin ions with charged states varying from 5+ to 13+.

原文???core.languages.en_GB???
主出版物標題Physics and Simulation of Optoelectronic Devices XXIII
編輯Bernd Witzigmann, Yasuhiko Arakawa, Fritz Henneberger, Marek Osinski
發行者SPIE
ISBN(電子)9781628414479
DOIs
出版狀態已出版 - 2015
事件23rd SPIE Conference on Physics and Simulation of Optoelectronic Devices - San Francisco, United States
持續時間: 9 2月 201512 2月 2015

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
9357
ISSN(列印)0277-786X
ISSN(電子)1996-756X

???event.eventtypes.event.conference???

???event.eventtypes.event.conference???23rd SPIE Conference on Physics and Simulation of Optoelectronic Devices
國家/地區United States
城市San Francisco
期間9/02/1512/02/15

指紋

深入研究「Modeling extreme-ultraviolet emission from laser-produced plasma using particle-in-cell method」主題。共同形成了獨特的指紋。

引用此