Minimizing residual stress of aluminum nitride (AlN) thin films using multi-step deposition of DC pulsed sputtering

Wei Lun Chen, Shang Shian Yang, Ning Hsiu Yuan, Wei Yu Zhou, Yu Pu Yang, Hsiao Han Lo, Peter J. Wang, Walter Lai, Yiin Kuen Fuh, Tomi T. Li

研究成果: 書貢獻/報告類型會議論文篇章同行評審

1 引文 斯高帕斯(Scopus)

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Keyphrases

Material Science

Engineering

Chemical Engineering