Magnetic Field Resonance and Pressure Effects on Epitaxial Thin Film Deposition and In Situ Plasma Diagnostics

C. R. Yang, C. H. Yeh, L. C. Hu, T. C. Wei, C. C. Lee, J. Y. Chang, T. T. Li

研究成果: 雜誌貢獻期刊論文同行評審

摘要

This study demonstrated the use of quadrupole mass spectrometry and optical emission spectrometry in diagnosing the plasma in the electron cyclotron resonance chemical vapor deposition (ECRCVD) process. The effects of adjusting the main magnetic coil current and process pressure on chemical composition of the plasma and the characteristics of the epitaxial thin film in the ECRCVD system were investigated. When the main magnetic coil current increased, the deposition rate of thin film increased, with no major effect on thin film crystallization. However, when the process pressure was higher, both the deposition rate and crystallization of epitaxial thin film increased.

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頁(從 - 到)247-259
頁數13
期刊Plasma Chemistry and Plasma Processing
38
發行號1
DOIs
出版狀態已出版 - 1 1月 2018

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