Machine Learning Assisted In-Situ Sensing and Detection on System of PECVD Depositing Hydrogenated Silicon Films

Yu Pu Yang, Hsiao Han Lo, Wei Lun Chen, Song Ho Wang, Te Yun Lu, Hsueh Er Chang, Peter J. Wang, Walter Lai, Yiin Kuen Fuh, Tomi T. Li

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

Plasma enhanced chemical vapor deposition (PECVD) is commonly known to be used in the field of silicon thin-film solar systems for the application of nanocrystalline silicon (nc-Si:H) film. The chemical deposition is a rather lengthy process, and it is difficult to determine the crystallization and crystalline phase of the thin film prior to X-ray diffraction (XRD) measurements. In this study, we are trying to analyze the spectral data collected by optical emission spectroscopy (OES) to find out there is any correlation between OES data and crystalline status. We used machine learning onto an in-situ detection tool to forecast this correlation. The collected large-scale OES spectral data obtained via principal component analysis (PCA) was used for the prediction of the crystalline phase in films without necessary experiments performed afterwards. Therefore, this method can be applicable to the field of thin film deposition for the detection of properties on thin films.

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主出版物標題China Semiconductor Technology International Conference 2021, CSTIC 2021
編輯Cor Claeys, Steve X. Liang, Qinghuang Lin, Ru Huang, Hanming Wu, Peilin Song, Linyong Pang, Ying Zhang, Beichao Zhang, Xinping Xinping Qu, Cheng Zhuo, Hsiang-Lan Lung
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781665449458
DOIs
出版狀態已出版 - 14 3月 2021
事件2021 China Semiconductor Technology International Conference, CSTIC 2021 - Shanghai, China
持續時間: 14 3月 202115 3月 2021

出版系列

名字China Semiconductor Technology International Conference 2021, CSTIC 2021

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???event.eventtypes.event.conference???2021 China Semiconductor Technology International Conference, CSTIC 2021
國家/地區China
城市Shanghai
期間14/03/2115/03/21

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