摘要
Lattice-matched and dislocation-free In0.29Al0.71As/In0.3Ga0.7As heterostructures with an improved Schottky barrier height have been realized on GaAs substrates. Through the temperature-dependent Hall effect as well as TEM analysis, the effectiveness of dislocation filtering have been verified. Based on the doped-channel approach, high current capability and high device performance were demonstrated for metamorphic doped-channel field effect transistors.
原文 | ???core.languages.en_GB??? |
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頁(從 - 到) | 408-411 |
頁數 | 4 |
期刊 | Conference Proceedings - International Conference on Indium Phosphide and Related Materials |
出版狀態 | 已出版 - 1995 |
事件 | Proceedings of the 7th International Conference on Indium Phosphide and Related Materials - Sapporo, Jpn 持續時間: 9 5月 1995 → 13 5月 1995 |