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Lattice-matched AlInN/GaN/AlGaN/GaN heterostructured-double-channel metal-oxide-semiconductor high-electron mobility transistors with multiple-mesa-fin-channel array
Hsin Ying Lee, Day Shan Liu,
Jen Inn Chyi
, Edward Yi Chang, Ching Ting Lee
前瞻科技研究中心
電機工程學系
光電科學研究中心
研究成果
:
雜誌貢獻
›
期刊論文
›
同行評審
5
引文 斯高帕斯(Scopus)
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深入研究「Lattice-matched AlInN/GaN/AlGaN/GaN heterostructured-double-channel metal-oxide-semiconductor high-electron mobility transistors with multiple-mesa-fin-channel array」主題。共同形成了獨特的指紋。
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Keyphrases
AlGaN-GaN
100%
AlInN
100%
Array of Channels
100%
Control Capability
50%
Cut-off Frequency
25%
Double Hump
25%
Double-channel
100%
Electrical Field
25%
Field Modulation
25%
Finned Channel
100%
Flicker Noise
25%
Ga2O3
75%
Gallium Oxide
25%
GaN Layers
25%
Gate Control
50%
Gate Oxide
50%
Heterostructure
100%
High-quality Interface
25%
Laser Interference Photolithography System
25%
Lattice Matching
100%
Low Noise
25%
MOS-HEMT
100%
Noise Spectral Density
25%
Oscillation Frequency
25%
Oxide Layer
50%
Semiconductors
25%
Sidewall
25%
Transconductance
25%
Vapor Cooling Condensation System
25%
Engineering
Condensation System
50%
Control Gate
100%
Cutoff Frequency
50%
Electric Field
50%
Flicker Noise
50%
Gate Oxide
100%
Laser Interference Photolithography
50%
Metal Oxide Semiconductor
100%
Noise Power
50%
Oxide Layer
100%
Power Density
50%
Side Wall
50%
Earth and Planetary Sciences
Electric Field
100%
Gallium Oxides
100%
High Electron Mobility Transistors
100%
Low Noise
100%
Metal Oxide Semiconductor
100%
Photolithography
100%
Transconductance
100%
Physics
Condensation
100%
Electric Field
100%
High Electron Mobility Transistors
100%
Low Noise
100%
Metal Oxide Semiconductor
100%
Photolithography
100%
Material Science
Density
33%
Electron Mobility
100%
Gallium
33%
Metal Oxide
100%
Oxide Compound
100%
Oxide Semiconductor
100%
Transistor
100%