Kinetic modeling of the NF3 decomposition via dielectric barrier discharges in N2/NF3 mixtures

Hsin Liang Chen, How Ming Lee, Moo Been Chang

研究成果: 雜誌貢獻期刊論文同行評審

12 引文 斯高帕斯(Scopus)

摘要

Emission of PFCs (perfluorocompound) has attracted mich attention in recent years due to its relatively high contribution to the global warming. Non-thermal plasma is one of the most promising technologies to effectively control the PFC emissions. In this study, a cylindrical DBD (dielectric barrier discharge) reactor is adopted for the treatment of NF3-containing streams. Besides the experimental work, a numerical model is also developed for better understanding of the reaction mechanism of NF3 abatement in N2/NF3 mixtures. Good agreement is observed between the experimental data and the simulation results. Simulation results indicate that the electrons and the N atoms are the major active s clos responsible for the NF3 decomposition. In addition, N2(A3u+) metastables plays a significant role in the NF3 abatement. A simplified mechanism for the NF3 decomposition in the N2 - NF3 plasmas is proposed as well. A figure is presented. Reaction mechanisms for the decomposition of NF3 in a N2 - NF3 plasma.

原文???core.languages.en_GB???
頁(從 - 到)682-691
頁數10
期刊Plasma Processes and Polymers
3
發行號9
DOIs
出版狀態已出版 - 17 11月 2006

指紋

深入研究「Kinetic modeling of the NF3 decomposition via dielectric barrier discharges in N2/NF3 mixtures」主題。共同形成了獨特的指紋。

引用此