Interfacial properties at the organic-metal interface probed using quantum well states

Meng Kai Lin, Yasuo Nakayama, Chin Yung Wang, Jer Chia Hsu, Chih Hao Pan, Shin Ichi MacHida, Tun Wen Pi, Hisao Ishii, S. J. Tang

研究成果: 雜誌貢獻期刊論文同行評審

7 引文 斯高帕斯(Scopus)

摘要

Using angle-resolved photoemission spectroscopy, we investigated the interfacial properties between the long-chain normal-alkane molecule n-CH 3(CH 2) 42CH 3 [tetratetracontane (TTC)] and uniform Ag films using the Ag quantum well states. The entire quantum well state energy band dispersions were observed to shift toward the Fermi level with increasing adsorption coverage of TTC up to 1 monolayer (ML). However, the energy shifts upon deposition of 1 ML of TTC are approximately inversely dependent on the Ag film thickness, indicating a quantum-size effect. In the framework of the pushback and image-force models, we applied the Bohr-Sommerfeld quantization rule with the modified Coulomb image potential for the phase shift at the TTC/Ag interface to extract the dielectric constant for 1 ML of TTC.

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文章編號155453
期刊Physical Review B - Condensed Matter and Materials Physics
86
發行號15
DOIs
出版狀態已出版 - 31 10月 2012

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