摘要
InAlGaAs/InGaAs quaternary high electron mobility transistors grown on InP substrates were fabricated and evaluated. The transistor performance was improved by adding Ga atoms into the InAlAs layers. The sidegating effect was also reduced. The device became more reliable by using the quaternary InAlGaAs as Schottky and buffer layers.
| 原文 | ???core.languages.en_GB??? |
|---|---|
| 頁(從 - 到) | 412-415 |
| 頁數 | 4 |
| 期刊 | Conference Proceedings - International Conference on Indium Phosphide and Related Materials |
| 出版狀態 | 已出版 - 1995 |
| 事件 | Proceedings of the 7th International Conference on Indium Phosphide and Related Materials - Sapporo, Jpn 持續時間: 9 5月 1995 → 13 5月 1995 |
指紋
深入研究「In0.52(Al0.9Ga0.1)0.48As/In0.53Ga0.47As HEMTs on InP substrates」主題。共同形成了獨特的指紋。引用此
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