Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films

C. Y. Yen; S. R. Jian; G. J. Chen; C. M. Lin; H. Y. Lee; W. C. Ke; Y. Y. Liao; P. F. Yang; C. T. Wang; Y. S. Lai; Jason S.C. Jang; J. Y. Juang

doi:10.1016/j.apsusc.2011.04.088

Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films

C. Y. Yen, S. R. Jian, G. J. Chen, C. M. Lin, H. Y. Lee, W. C. Ke, Y. Y. Liao, P. F. Yang, C. T. Wang, Y. S. Lai, Jason S.C. Jang, J. Y. Juang

材料科學與工程研究所

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

56 引文斯高帕斯（Scopus）

摘要

ZnO thin films grown on Si(1 1 1) substrates by using atomic layer deposition (ALD) were annealed at the temperatures ranging from 300 to 500 °C. The X-ray diffraction (XRD) results show that the annealed ZnO thin films are highly (0 0 2)-oriented, indicating a well ordered microstructure. The film surface examined by the atomic force microscopy (AFM), however, indicated that the roughness increases with increasing annealing temperature. The photoluminescence (PL) spectrum showed that the intensity of UV emission was strongest for films annealed at 500 °C. The mechanical properties of the resultant ZnO thin films investigated by nanoindentation reveal that the hardness decreases from 9.2 GPa to 7.2 GPa for films annealed at 300 °C and 500 °C, respectively. On the other hand, the Young's modulus for the former is 168.6 GPa as compared to a value of 139.5 GPa for the latter. Moreover, the relationship between the hardness and film grain size appear to follow closely with the Hall-Petch equation.

原文	???core.languages.en_GB???
頁（從 - 到）	7900-7905
頁數	6
期刊	Applied Surface Science
卷	257
發行號	17
DOIs	https://doi.org/10.1016/j.apsusc.2011.04.088
出版狀態	已出版 - 15 6月 2011

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Yen, C. Y., Jian, S. R., Chen, G. J., Lin, C. M., Lee, H. Y., Ke, W. C., Liao, Y. Y., Yang, P. F., Wang, C. T., Lai, Y. S., Jang, J. S. C., & Juang, J. Y. (2011). Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films. Applied Surface Science, 257(17), 7900-7905. https://doi.org/10.1016/j.apsusc.2011.04.088

@article{c7e27c80ddad411798f71c864b9f382d,

title = "Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films",

abstract = "ZnO thin films grown on Si(1 1 1) substrates by using atomic layer deposition (ALD) were annealed at the temperatures ranging from 300 to 500 °C. The X-ray diffraction (XRD) results show that the annealed ZnO thin films are highly (0 0 2)-oriented, indicating a well ordered microstructure. The film surface examined by the atomic force microscopy (AFM), however, indicated that the roughness increases with increasing annealing temperature. The photoluminescence (PL) spectrum showed that the intensity of UV emission was strongest for films annealed at 500 °C. The mechanical properties of the resultant ZnO thin films investigated by nanoindentation reveal that the hardness decreases from 9.2 GPa to 7.2 GPa for films annealed at 300 °C and 500 °C, respectively. On the other hand, the Young's modulus for the former is 168.6 GPa as compared to a value of 139.5 GPa for the latter. Moreover, the relationship between the hardness and film grain size appear to follow closely with the Hall-Petch equation.",

keywords = "AFM, Atomic layer deposition, Hardness, Nanoindentation, XRD, ZnO thin films",

author = "Yen, {C. Y.} and Jian, {S. R.} and Chen, {G. J.} and Lin, {C. M.} and Lee, {H. Y.} and Ke, {W. C.} and Liao, {Y. Y.} and Yang, {P. F.} and Wang, {C. T.} and Lai, {Y. S.} and Jang, {Jason S.C.} and Juang, {J. Y.}",

note = "Funding Information: This work was partially supported by the National Science Council of Taiwan , under grant no.: NSC97-2112-M-214-002-MY2 and NSC99-2112-M-214-001 . JYJ is partially supported by the MOE-ATU program operated at NCTU . ",

year = "2011",

month = jun,

day = "15",

doi = "10.1016/j.apsusc.2011.04.088",

language = "???core.languages.en_GB???",

volume = "257",

pages = "7900--7905",

journal = "Applied Surface Science",

issn = "0169-4332",

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TY - JOUR

T1 - Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films

AU - Yen, C. Y.

AU - Jian, S. R.

AU - Chen, G. J.

AU - Lin, C. M.

AU - Lee, H. Y.

AU - Ke, W. C.

AU - Liao, Y. Y.

AU - Yang, P. F.

AU - Wang, C. T.

AU - Lai, Y. S.

AU - Jang, Jason S.C.

AU - Juang, J. Y.

N1 - Funding Information: This work was partially supported by the National Science Council of Taiwan , under grant no.: NSC97-2112-M-214-002-MY2 and NSC99-2112-M-214-001 . JYJ is partially supported by the MOE-ATU program operated at NCTU .

PY - 2011/6/15

Y1 - 2011/6/15

N2 - ZnO thin films grown on Si(1 1 1) substrates by using atomic layer deposition (ALD) were annealed at the temperatures ranging from 300 to 500 °C. The X-ray diffraction (XRD) results show that the annealed ZnO thin films are highly (0 0 2)-oriented, indicating a well ordered microstructure. The film surface examined by the atomic force microscopy (AFM), however, indicated that the roughness increases with increasing annealing temperature. The photoluminescence (PL) spectrum showed that the intensity of UV emission was strongest for films annealed at 500 °C. The mechanical properties of the resultant ZnO thin films investigated by nanoindentation reveal that the hardness decreases from 9.2 GPa to 7.2 GPa for films annealed at 300 °C and 500 °C, respectively. On the other hand, the Young's modulus for the former is 168.6 GPa as compared to a value of 139.5 GPa for the latter. Moreover, the relationship between the hardness and film grain size appear to follow closely with the Hall-Petch equation.

AB - ZnO thin films grown on Si(1 1 1) substrates by using atomic layer deposition (ALD) were annealed at the temperatures ranging from 300 to 500 °C. The X-ray diffraction (XRD) results show that the annealed ZnO thin films are highly (0 0 2)-oriented, indicating a well ordered microstructure. The film surface examined by the atomic force microscopy (AFM), however, indicated that the roughness increases with increasing annealing temperature. The photoluminescence (PL) spectrum showed that the intensity of UV emission was strongest for films annealed at 500 °C. The mechanical properties of the resultant ZnO thin films investigated by nanoindentation reveal that the hardness decreases from 9.2 GPa to 7.2 GPa for films annealed at 300 °C and 500 °C, respectively. On the other hand, the Young's modulus for the former is 168.6 GPa as compared to a value of 139.5 GPa for the latter. Moreover, the relationship between the hardness and film grain size appear to follow closely with the Hall-Petch equation.

KW - AFM

KW - Atomic layer deposition

KW - Hardness

KW - Nanoindentation

KW - XRD

KW - ZnO thin films

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U2 - 10.1016/j.apsusc.2011.04.088

DO - 10.1016/j.apsusc.2011.04.088

M3 - 期刊論文

AN - SCOPUS:79957497908

SN - 0169-4332

VL - 257

SP - 7900

EP - 7905

JO - Applied Surface Science

JF - Applied Surface Science

IS - 17

ER -

Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films

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