摘要
The first high-quality in situ STM atomic images of sputtering-deposited platinum film electrodes potentio-stated at 0.15 V (vs. RHE) in 0.1 M HClO4 are reported showing that potential-induced hydrogen adsorption effectively cleaned the Pt surfaces with predominantly (111)-oriented facets.
原文 | ???core.languages.en_GB??? |
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頁(從 - 到) | 2279-2280 |
頁數 | 2 |
期刊 | Chemical Communications |
發行號 | 22 |
DOIs | |
出版狀態 | 已出版 - 21 11月 2000 |